Nano Archive

Distinctive features and problems of CMOS technology for decrease in the node size to 0.18 ?m or less

Krasnikov, G. Ya. and Orlov, O. M. (2008) Distinctive features and problems of CMOS technology for decrease in the node size to 0.18 ?m or less. Nanotechnologies in Russia, Volume 3 (7-8). pp. 502-506.

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Official URL: http://www.springerlink.com/content/w81505874jk47w...

Abstract

The main problems and distinctive features in developing CMOS VLSI technology are considered for a decrease in the node size to 0.18 ?m or less. This becomes possible on the basis of a complex solution of a number of research and technical problems including special equipment and technological processes and advanced design engineering solutions for semiconductor structural formation.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Engineering > Nanotechnology applications in mechanical engineering
ID Code:2067
Deposited By:Prof. Alexey Ivanov
Deposited On:19 Dec 2008 13:11
Last Modified:01 Feb 2009 19:23

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