Krasnikov, G. Ya. and Orlov, O. M. (2008) Distinctive features and problems of CMOS technology for decrease in the node size to 0.18 ?m or less. Nanotechnologies in Russia, Volume 3 (7-8). pp. 502-506.
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Official URL: http://www.springerlink.com/content/w81505874jk47w...
The main problems and distinctive features in developing CMOS VLSI technology are considered for a decrease in the node size to 0.18 ?m or less. This becomes possible on the basis of a complex solution of a number of research and technical problems including special equipment and technological processes and advanced design engineering solutions for semiconductor structural formation.
|Subjects:||Material Science > Nanofabrication processes and tools|
Engineering > Nanotechnology applications in mechanical engineering
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||19 Dec 2008 13:11|
|Last Modified:||01 Feb 2009 19:23|
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