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The Modeling of Process of Simultaneous Alloying by Recoil Atoms and Bombarding Ions at Bombarding Structures Films-Substrates.

Kuznetsov, A.G. and Shautsukov, G. D. (2006) The Modeling of Process of Simultaneous Alloying by Recoil Atoms and Bombarding Ions at Bombarding Structures Films-Substrates. Journal of NANO and MICROSYSTEM TECHNIQUE, 9 (9). pp. 36-39.

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Abstract

On the base of the represented physical model of ionic implantation through firms and alloying by recoil atoms was developed the packet of mathematical programs of modeling of indicated processes.Carried out numerical experiment and shown that ionic bombardment of film — substrate structures allows to from thin high — alloy layers, by recoil atoms, the thickness by the was of several hundred pans of micron, to form such alloyed by bombarded ionic layers of different thickness and by the level of alloying. To realize the simultaneous alloying of substrate by recoil atoms and by bombarded ions

Item Type:Article
ID Code:1997
Deposited By:Prof. Alexey Ivanov
Deposited On:19 Dec 2008 13:20
Last Modified:06 Feb 2009 14:33

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