Nano Archive

Accuracy of the Photolithography Processes and Photolithography Equipment.

M., Ageichenko A.S.Tochilsky Ja. I. Vasiliev À.À. Yesman V. (2006) Accuracy of the Photolithography Processes and Photolithography Equipment. Journal of NANO and MICROSYSTEM TECHNIQUE, 12 (12). pp. 47-52.

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Official URL: http://www.microsystems.ru/

Abstract

Basic parameters of micro- and nanotechnology depends on geometric accuracy of the structure formation processes, which are determined by the accuracy of the photolithography processes and equipment. Between the two parameters; accuracy of feature size (CD) and overlay error, overlay error is the decisive one. In this article methods to reduce this error in photolithography and photolithography equipment are discussed.

Item Type:Article
ID Code:1979
Deposited By:Prof. Alexey Ivanov
Deposited On:19 Dec 2008 13:19
Last Modified:20 Mar 2009 08:58

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