M., Ageichenko A.S.Tochilsky Ja. I. Vasiliev À.À. Yesman V. (2006) Accuracy of the Photolithography Processes and Photolithography Equipment. Journal of NANO and MICROSYSTEM TECHNIQUE, 12 (12). pp. 47-52.
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www.microsystems.ru/
Abstract
Basic parameters of micro- and nanotechnology depends on geometric accuracy of the structure formation processes, which are determined by the accuracy of the photolithography processes and equipment. Between the two parameters; accuracy of feature size (CD) and overlay error, overlay error is the decisive one. In this article methods to reduce this error in photolithography and photolithography equipment are discussed.
| Item Type: | Article |
|---|---|
| ID Code: | 1979 |
| Deposited By: | Prof. Alexey Ivanov |
| Deposited On: | 19 Dec 2008 13:19 |
| Last Modified: | 20 Mar 2009 08:58 |
Repository Staff Only: item control page
