M., Ageichenko A.S.Tochilsky Ja. I. Vasiliev À.À. Yesman V. (2006) Accuracy of the Photolithography Processes and Photolithography Equipment. Journal of NANO and MICROSYSTEM TECHNIQUE, 12 (12). pp. 47-52.
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Basic parameters of micro- and nanotechnology depends on geometric accuracy of the structure formation processes, which are determined by the accuracy of the photolithography processes and equipment. Between the two parameters; accuracy of feature size (CD) and overlay error, overlay error is the decisive one. In this article methods to reduce this error in photolithography and photolithography equipment are discussed.
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||19 Dec 2008 13:19|
|Last Modified:||20 Mar 2009 08:58|
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