Nano Archive

Nanoimprint lithography for nanophotonics in silicon

Bruinink, Christiaan M. and Burresi, Matteo and de Boer, Meint J. and Segerink, Frans B. and Jansen, Henri V. and Berenschot, E and Reinhoudt, David N. and Huskens, Jurriaan and Kuipers, L (2008) Nanoimprint lithography for nanophotonics in silicon. NANO LETTERS, 8 (9). pp. 2872-2877.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://pubs.acs.org/doi/abs/10.1021/nl801615c

Abstract

A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Technology > Manufacturing processes for nanotechnology
Physical Science > Photonics
ID Code:1929
Deposited By:Farnush Anwar
Deposited On:16 Dec 2008 15:25
Last Modified:12 Feb 2009 17:27

Repository Staff Only: item control page