Bruinink, Christiaan M. and Burresi, Matteo and de Boer, Meint J. and Segerink, Frans B. and Jansen, Henri V. and Berenschot, E and Reinhoudt, David N. and Huskens, Jurriaan and Kuipers, L (2008) Nanoimprint lithography for nanophotonics in silicon. NANO LETTERS, 8 (9). pp. 2872-2877.
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Official URL: http://pubs.acs.org/doi/abs/10.1021/nl801615c
Abstract
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
| Item Type: | Article |
|---|---|
| Subjects: | Material Science > Nanofabrication processes and tools Technology > Manufacturing processes for nanotechnology Physical Science > Photonics |
| ID Code: | 1929 |
| Deposited By: | Farnush Anwar |
| Deposited On: | 16 Dec 2008 15:25 |
| Last Modified: | 12 Feb 2009 17:27 |
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