Bruinink, Christiaan M. and Burresi, Matteo and de Boer, Meint J. and Segerink, Frans B. and Jansen, Henri V. and Berenschot, E and Reinhoudt, David N. and Huskens, Jurriaan and Kuipers, L (2008) Nanoimprint lithography for nanophotonics in silicon. NANO LETTERS, 8 (9). pp. 2872-2877.
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Official URL: http://pubs.acs.org/doi/abs/10.1021/nl801615c
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
|Subjects:||Material Science > Nanofabrication processes and tools|
Technology > Manufacturing processes for nanotechnology
Physical Science > Photonics
|Deposited By:||Farnush Anwar|
|Deposited On:||16 Dec 2008 15:25|
|Last Modified:||12 Feb 2009 17:27|
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