Nano Archive

Metal direct nanoimprinting for photonics

Buzzi, Stefano and Robin, Franck and Callegari, Victor and Loeffler, Jorg F. (2008) Metal direct nanoimprinting for photonics. MICROELECTRONIC ENGINEERING, 85 (2). pp. 419-424.

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In this paper metal direct nanoimprinting (embossing) for the production of metallic microparts is discussed, with a main focus on its suitability for the fabrication of metal-containing optical devices such as photonic crystals, plasmon waveguides or chiral structures. Silver and gold were chosen, since they have the lowest light absorption in the near infrared and visible range. They are also easily formable due to their good ductility, which can be further enhanced by processing at elevated temperature. The mold material, which may form part of the optical device, usually consisted of silicon, but other dielectric materials such as silicon oxide and silicon nitride were also successfully tested. Cylindrical and line-shaped holes with lateral dimensions down to 250 nm and aspect ratios of up to 5 were etched in silicon wafers. All the structures were successfully filled with silver and gold, and the filling of smaller dimensions is also deemed possible. This technique is therefore suitable for producing metal-containing optical devices working in the infrared, at least down to the standard telecom wavelength of 1.5 mu m, which requires metallic dimensions of 200-300 nm. (c) 2007 Elsevier B.V. All rights reserved.

Item Type:Article
Uncontrolled Keywords:microforming; coining; microforging; metamaterials; nanoimprint lithography; nano-printing
Subjects:Material Science > Nanofabrication processes and tools
Technology > Manufacturing processes for nanotechnology
Physical Science > Photonics
ID Code:1507
Deposited By:Farnush Anwar
Deposited On:11 Dec 2008 15:57
Last Modified:11 Dec 2008 15:57

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