Passaro, Vittorio M. N. and Dell'Olio, Francesco (2008) Scaling and optimization of MOS optical modulators in nanometer SOI waveguides. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 7 (4). pp. 401-408.
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Official URL: http://dx.doi.org/10.1109/TNANO.2008.920207
Abstract
In this paper, a very accurate model of optical modulators in silicon-on-insulator technology is developed and validated using experimental results reported in literature. Using an optimized nanometer MOS structure, a significant bandwidth increase (around 45%), length decrease (around four times), and power consumption reduction (three times) with respect to the state-of-the-art have been obtained.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | integrated optics; MOS capacitors; optical modulation; plasma-dispersion effect; silicon photonics |
| Subjects: | Physical Science > Nanoelectronics Physical Science > Photonics Engineering > Nanotechnology applications in ICT |
| ID Code: | 1427 |
| Deposited By: | Farnush Anwar |
| Deposited On: | 15 Dec 2008 11:41 |
| Last Modified: | 15 Dec 2008 11:41 |
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