Passaro, Vittorio M. N. and Dell'Olio, Francesco (2008) Scaling and optimization of MOS optical modulators in nanometer SOI waveguides. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 7 (4). pp. 401-408.
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Official URL: http://dx.doi.org/10.1109/TNANO.2008.920207
In this paper, a very accurate model of optical modulators in silicon-on-insulator technology is developed and validated using experimental results reported in literature. Using an optimized nanometer MOS structure, a significant bandwidth increase (around 45%), length decrease (around four times), and power consumption reduction (three times) with respect to the state-of-the-art have been obtained.
|Uncontrolled Keywords:||integrated optics; MOS capacitors; optical modulation; plasma-dispersion effect; silicon photonics|
|Subjects:||Physical Science > Nanoelectronics|
Physical Science > Photonics
Engineering > Nanotechnology applications in ICT
|Deposited By:||Farnush Anwar|
|Deposited On:||15 Dec 2008 11:41|
|Last Modified:||15 Dec 2008 11:41|
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