Nano Archive

High-aspect-ratio nanopillar structures fabricated by nanoimprinting with elongation phenomenon

Kuwabara, Kosuke and Miyauchi, Akihiro (2008) High-aspect-ratio nanopillar structures fabricated by nanoimprinting with elongation phenomenon. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 26 (2). pp. 582-584.

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Official URL: http://dx.doi.org/10.1116/1.2889396

Abstract

The authors found that fine pillar structures (nanopillars) with a high aspect ratio were formed by nanoimprinting with elongation phenomenon. Polymer nanopillars with higher aspect ratios than that of corresponding holes on the mold were obtained without any etching processes after nanoimprinting. The finest nanopillars were 95 nm in diameter and 4.1 mu m high made of polystyrene. Elongated nanopillars of poly (methylmethacrylate) and polystyrene were confirmed. Elongation of nanopillars depended on process conditions such as the diameter of holes on the mold, the unmolding temperature, and the molecular weight of the polymer resin. (C) 2008 American Vacuum Society.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanostructured materials
ID Code:1371
Deposited By:Anuj Seth
Deposited On:09 Dec 2008 12:06
Last Modified:09 Dec 2008 12:06

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