Nano Archive

Room temperature nanoimprint lithography using molds fabricated by molecular beam epitaxy

Harrer, Stefan and Strobel, Sebastian and Scarpa, Giuseppe and Abstreiter, Gerhard and Tornow, Marc and Lugli, Paolo (2008) Room temperature nanoimprint lithography using molds fabricated by molecular beam epitaxy. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 7 (3). pp. 363-370.

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We have demonstrated single-step room temperature nanoimprint lithography (RTNIL) using polystyrene (PS, average molecular weights ranging from 13 to 97 kg/mol) as the imprint polymer layer on a silicon substrate for imprinting rectangular line patterns with varying aspect ratios, ranging from 11 to 500 inn wide. To accomplish this demonstration, we designed and built a tool that controllably pressed a mold into a stationary imprint sanipleapplying imprint pressures between 280 and 700 MPa. The molds used in these experiments were GaAs/AlGaAs sandwich structures fabricated by molecular beam epitaxy (MBE) that we cleaved and selectively etched afterward in order to generate 3-D grating structures with nanometer resolution on their edges. We fabricated positive and negative molds comprising single-line as well as multiline patterns with different aspect ratios and linewidths between 9 and 300 nm.

Item Type:Article
Uncontrolled Keywords:GaAs/AlGaAs; molecular beam epitaxy (MBE); nanofabrication; nanoimprint lithography; room temperature nanoimprint lithography (RTNIL)
Subjects:Material Science > Nanofabrication processes and tools
ID Code:1319
Deposited By:Anuj Seth
Deposited On:09 Dec 2008 17:25
Last Modified:09 Dec 2008 17:25

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