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Photo-stimulated processes in nanoelectronical technologies [in Russian]

Jibuti, Z. V. (2011) Photo-stimulated processes in nanoelectronical technologies [in Russian]. Nano Studies, 4 . pp. 73-78. ISSN 1987-8826

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Official URL: http://www.tech.caucasus.net

Abstract

It is demonstrated that the method of photostimulated annealing always played an important role in technologies for micro- and nanoelectronics. These are the formation and crystallization of Si-nanoclusters in SiN_x:H films, modification of quantum dots in Ge/Si nanostructures, crystallization of hydrogenized films of amorphous silicon, preparation of thin p-n junctions in Si, photostimulated crystallization and relaxation of internal mechanical stresses in epitaxial nano-structures of Si-on-insulator-type, doping of semiconducting nanoclusters, etc.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Physical Science > Nanoelectronics
Divisions:Faculty of Engineering, Science and Mathematics > School of Physics
ID Code:11661
Deposited By:Professor Levan Chkhartishvili
Deposited On:05 Jan 2012 17:38
Last Modified:05 Jan 2012 17:38

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