Photo-stimulated processes in nanoelectronical technologies [in Russian]

Abstract

It is demonstrated that the method of photostimulated annealing always played an important role in technologies for micro- and nanoelectronics. These are the formation and crystallization of Si-nanoclusters in SiN_x:H films, modification of quantum dots in Ge/Si nanostructures, crystallization of hydrogenized films of amorphous silicon, preparation of thin p-n junctions in Si, photostimulated crystallization and relaxation of internal mechanical stresses in epitaxial nano-structures of Si-on-insulator-type, doping of semiconducting nanoclusters, etc.