Buttard, D and Oelher, F and David, T (2011) Gold colloidal nanoparticle electrodeposition on a silicon surface in a uniform electric field. NANOSCALE RESEARCH LETTERS, 6 (1). pp. 1-8. ISSN 1931-7573 (Print) 1556-276X (Online)
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Official URL: http://www.nanoscalereslett.com/content/6/1/580
Abstract
The electrodeposition of gold colloidal nanoparticles on a silicon wafer in a uniform electric field is investigated using scanning electron microscopy and homemade electrochemical cells. Dense and uniform distributions of particles are obtained with no aggregation. The evolution of surface particle density is analyzed in relation to several parameters: applied voltage, electric field, exchanged charge. Electrical, chemical, and electrohydrodynamical parameters are taken into account in describing the electromigration process.
| Item Type: | Article |
|---|---|
| Subjects: | Material Science > Nanofabrication processes and tools Analytical Science > Beam methods |
| ID Code: | 11592 |
| Deposited By: | M T V |
| Deposited On: | 05 Jan 2012 10:19 |
| Last Modified: | 05 Jan 2012 10:19 |
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