Belova, L M and Dahlberg, E D and Riazanova, A and Mulders, J J L and Christophersen, C and Eckert, J (2011) Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth. Nanotechnology, 22 (14). p. 145305.
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Official URL: http://stacks.iop.org/0957-4484/22/i=14/a=145305
A new method of direct, rapid nano- to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co 2 (CO) 8 is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 Â°C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity,22 ÂµÎ© cm, and saturation magnetization, 1.55 T, are much closer to the corresponding values for bulk Co than those for standard EBID.
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||01 Nov 2011 23:31|
|Last Modified:||02 Nov 2011 00:47|
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