Nano Archive

Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth

Belova, L M and Dahlberg, E D and Riazanova, A and Mulders, J J L and Christophersen, C and Eckert, J (2011) Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth. Nanotechnology, 22 (14). p. 145305.

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Official URL: http://stacks.iop.org/0957-4484/22/i=14/a=145305

Abstract

A new method of direct, rapid nano- to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co 2 (CO) 8 is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 °C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity,22 µΩ cm, and saturation magnetization, 1.55 T, are much closer to the corresponding values for bulk Co than those for standard EBID.

Item Type:Article
ID Code:11287
Deposited By:Prof. Alexey Ivanov
Deposited On:01 Nov 2011 23:31
Last Modified:02 Nov 2011 00:47

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