Rashidi, Hassan and Yoshino, Masahiko (2010) Fabrication of sub-20 nm nanostructures by combination of nano plastic forming and etching (NPFE). Journal of Micromechanics and Microengineering, 20 (9). 095003.
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://stacks.iop.org/0960-1317/20/i=9/a=095003
In this paper, a novel nanofabrication process with sub-20 nm resolution and low cost is proposed and its feasibility is demonstrated. The process utilizes a metal coating as a resist mask. The metallic mask is patterned using nano plastic forming followed by etching the metallic mask to transfer the pattern onto the entire mask thickness and expose the surface of the substrate in the individual patterned areas. Then the pattern is transferred onto the substrate by anisotropic etching. Finally, the excess metal layer is removed from the substrate, and nanostructures fabricated on the substrate are revealed. The proposed process was experimentally studied, and nano-width trench arrays with sub-20 nm widths were fabricated on a silicon wafer over a large area.
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||01 Nov 2011 23:26|
|Last Modified:||02 Nov 2011 00:47|
Repository Staff Only: item control page