Liao, Y-X and Yi, F-T (2010) Nanopillars by cesium chloride self-assembly and dry etching. Nanotechnology, 21 (46). p. 465302.
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Official URL: http://stacks.iop.org/0957-4484/21/i=46/a=465302
Abstract
We introduce a method combining cesium chloride self-assembly and inductively coupled plasma to fabricate nanopillars with uniform coverage over an entire 4 inch prepatterned silicon wafer. This method can produce pillars with average diameters ranging from 50 nm to 1.5 µm, aspect ratios up to 13 and coverage ratios above 35%. Cesium chloride self-assembly utilizes the deliquescence of salt, with advantages of excellent tunability, high aspect ratio and potential for micro/nano mixed structures, which makes this technology promising in the areas of MEMS, solar cells, batteries, light emitting diodes, etc.
| Item Type: | Article |
|---|---|
| ID Code: | 11183 |
| Deposited By: | Prof. Alexey Ivanov |
| Deposited On: | 01 Nov 2011 23:25 |
| Last Modified: | 02 Nov 2011 00:47 |
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