Nano Archive

Nanopillars by cesium chloride self-assembly and dry etching

Liao, Y-X and Yi, F-T (2010) Nanopillars by cesium chloride self-assembly and dry etching. Nanotechnology, 21 (46). p. 465302.

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Official URL: http://stacks.iop.org/0957-4484/21/i=46/a=465302

Abstract

We introduce a method combining cesium chloride self-assembly and inductively coupled plasma to fabricate nanopillars with uniform coverage over an entire 4 inch prepatterned silicon wafer. This method can produce pillars with average diameters ranging from 50 nm to 1.5 µm, aspect ratios up to 13 and coverage ratios above 35%. Cesium chloride self-assembly utilizes the deliquescence of salt, with advantages of excellent tunability, high aspect ratio and potential for micro/nano mixed structures, which makes this technology promising in the areas of MEMS, solar cells, batteries, light emitting diodes, etc.

Item Type:Article
ID Code:11183
Deposited By:Prof. Alexey Ivanov
Deposited On:01 Nov 2011 23:25
Last Modified:02 Nov 2011 00:47

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