Zhang, Yi Wen and Wang, Lei and Yu, Yong Lin and Wang, Ding Li and Zhou, Ning and Liu, Wen (2011) High quality Bragg gratings fabricated by Nanoimprint Lithography. Journal of Physics: Conference Series, 276 (1). 012104.
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://stacks.iop.org/1742-6596/276/i=1/a=012104
Abstract
Nanoimprint lithography (NIL) is a very promising technology for nano structure fabrication, because of its high resolution, low cost and high throughput. In this paper, we have demonstrated high-resolution rectangular Bragg gratings for DFB LD by NIL technology. For the manufacture of high quality gratings, the stamp types and residual resist thickness are discussed, and an improved Simultaneous Thermal and UV (STU) imprint process with temperature-pressure variation is introduced.
| Item Type: | Article |
|---|---|
| ID Code: | 11171 |
| Deposited By: | Prof. Alexey Ivanov |
| Deposited On: | 01 Nov 2011 23:24 |
| Last Modified: | 02 Nov 2011 00:47 |
Repository Staff Only: item control page
