Nano Archive

Metalorganic chemical vapor deposition of Ti-O-C-N thin films using TBOT as a promising precursor

Fouad, O.A. and Geioushy, R.A. and El-Sheikh, S.M. and Khedr, M.H. and Ibrahim, I.A. (2011) Metalorganic chemical vapor deposition of Ti-O-C-N thin films using TBOT as a promising precursor. Journal of Alloys and Compounds, 509 (20). 6090 - 6095.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://www.sciencedirect.com/science/article/pii/S...


Item Type:Article
Uncontrolled Keywords:XPS
ID Code:11037
Deposited By:SPI
Deposited On:17 Apr 2012 14:44
Last Modified:17 Apr 2012 14:45

Repository Staff Only: item control page