Rashad, M.M. and Hessien, M.M. and Abdel-Aal, E.A. and El-Barawy, K. and Singh, R.K. (2011) Transformation of silica fume into chemical mechanical polishing (CMP) nano-slurries for advanced semiconductor manufacturing. Powder Technology, 205 (1-3). 149 - 154.
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Official URL: http://www.sciencedirect.com/science/article/pii/S...
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Advanced semiconductors |
| ID Code: | 11019 |
| Deposited By: | SPI |
| Deposited On: | 17 Apr 2012 14:49 |
| Last Modified: | 17 Apr 2012 14:49 |
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