Nano Archive

Transformation of silica fume into chemical mechanical polishing (CMP) nano-slurries for advanced semiconductor manufacturing

Rashad, M.M. and Hessien, M.M. and Abdel-Aal, E.A. and El-Barawy, K. and Singh, R.K. (2011) Transformation of silica fume into chemical mechanical polishing (CMP) nano-slurries for advanced semiconductor manufacturing. Powder Technology, 205 (1-3). 149 - 154.

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Official URL: http://www.sciencedirect.com/science/article/pii/S...


Item Type:Article
Uncontrolled Keywords:Advanced semiconductors
ID Code:11019
Deposited By:SPI
Deposited On:17 Apr 2012 14:49
Last Modified:17 Apr 2012 14:49

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