Bokarev, V.Ð . and Gornev, E.S. (2010) Application of Contact Lithography in Processes of Manufacturing Submicronic MEMS and Saw Devices. Journal of NANO and MICROSYSTEM TECHNIQUE (7).
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Official URL: http:// www.microsystems.ru
The applicability of contact, projective and imprint lithographs at manufacturing submicronic MEMS and SAW â devices are considered. Keywords: contact lithography, projective lithography, immersion lithography; imprint lithography, photoresist, photomask submicron sizes, MEMS, SAW-devices
|Additional Information:||Full text is in Russian|
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||08 Dec 2010 23:40|
|Last Modified:||09 Dec 2010 09:29|
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