Nano Archive

Application of Contact Lithography in Processes of Manufacturing Submicronic MEMS and Saw Devices

Bokarev, V.Р. and Gornev, E.S. (2010) Application of Contact Lithography in Processes of Manufacturing Submicronic MEMS and Saw Devices. Journal of NANO and MICROSYSTEM TECHNIQUE (7).

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Official URL: http:// www.microsystems.ru

Abstract

The applicability of contact, projective and imprint lithographs at manufacturing submicronic MEMS and SAW — devices are considered. Keywords: contact lithography, projective lithography, immersion lithography; imprint lithography, photoresist, photomask submicron sizes, MEMS, SAW-devices

Item Type:Article
Additional Information:Full text is in Russian
ID Code:10281
Deposited By:Prof. Alexey Ivanov
Deposited On:08 Dec 2010 23:40
Last Modified:09 Dec 2010 09:29

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