Bokarev, V.Ð . and Gornev, E.S. (2010) Application of Contact Lithography in Processes of Manufacturing Submicronic MEMS and Saw Devices. Journal of NANO and MICROSYSTEM TECHNIQUE (7).
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Official URL: http:// www.microsystems.ru
Abstract
The applicability of contact, projective and imprint lithographs at manufacturing submicronic MEMS and SAW â devices are considered. Keywords: contact lithography, projective lithography, immersion lithography; imprint lithography, photoresist, photomask submicron sizes, MEMS, SAW-devices
| Item Type: | Article |
|---|---|
| Additional Information: | Full text is in Russian |
| ID Code: | 10281 |
| Deposited By: | Prof. Alexey Ivanov |
| Deposited On: | 08 Dec 2010 23:40 |
| Last Modified: | 09 Dec 2010 09:29 |
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