Nano Archive

Doping in Nanocolumns of Surface Relief of Silicon Wafer

Tarnavsky, G.A. (2010) Doping in Nanocolumns of Surface Relief of Silicon Wafer. Journal of NANO and MICROSYSTEM TECHNIQUE (6).

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The investigation of technological process of implantation of doping impurities of acceptor and donor types (boron, phosphorus and arsenic) in silicon wafer with complicated surface nanorelief was conducted by computer simulation. Keywords: computer simulation, doping in silicon, implantation, donor and acceptor impurities, relief nano-columns

Item Type:Article
Additional Information:Full text is in Russian
ID Code:10274
Deposited By:Prof. Alexey Ivanov
Deposited On:08 Dec 2010 23:40
Last Modified:09 Dec 2010 09:29

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