Smolin, V.K. (2010) Liquid Nitrogen Use for Forming Microelectronic Structures. Journal of NANO and MICROSYSTEM TECHNIQUE (4).
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http:// www.microsystems.ru
Abstract
There are considered the issues related to the low-temperature processing use in the process of forming microelectronic structures. Efficiency of the processing in the liquid Nitrogen under cyclic effect is presented. Keywords: low-temperature processing, material modification, heterostructure, defect rearrangement
| Item Type: | Article |
|---|---|
| Additional Information: | Full text is in Russian |
| ID Code: | 10253 |
| Deposited By: | Prof. Alexey Ivanov |
| Deposited On: | 08 Dec 2010 23:40 |
| Last Modified: | 09 Dec 2010 09:29 |
Repository Staff Only: item control page
