Babaevsky, P.G. and Chetverov, Yu.S. and Obizhaev, D.Yu. and Zhukova, S.A. (2009) Properties and Structure of Nano-Thin Silicon Nitride Films Formed on Polyimide Surface by Low-Temperature Plasma Deposition. Journal of NANO and MICROSYSTEM TECHNIQUE (9).
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Silicon nitride films of 2â300 nm thickness deposited on polyimide coatings and films were investigated. Films were formed by low-temperature ECR chemical vapor deposition. It was shown that the ratio of precursor gases has an influence on chemical structure, morphology and surface energetic properties of the films and does not have an influence on Young's modulus. Keywords: silicon nitride, plasma deposition, deposition of a gas phase, microelectromechanical converters, suÂperficial microprocessing, a sacrificial layer, an elektron-cyclotron resonance.
|Additional Information:||Full text is in Russian|
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||08 Dec 2010 23:39|
|Last Modified:||09 Dec 2010 09:29|
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