Nano Archive

Properties and Structure of Nano-Thin Silicon Nitride Films Formed on Polyimide Surface by Low-Temperature Plasma Deposition

Babaevsky, P.G. and Chetverov, Yu.S. and Obizhaev, D.Yu. and Zhukova, S.A. (2009) Properties and Structure of Nano-Thin Silicon Nitride Films Formed on Polyimide Surface by Low-Temperature Plasma Deposition. Journal of NANO and MICROSYSTEM TECHNIQUE (9).

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Official URL: http:// www.microsystems.ru

Abstract

Silicon nitride films of 2—300 nm thickness deposited on polyimide coatings and films were investigated. Films were formed by low-temperature ECR chemical vapor deposition. It was shown that the ratio of precursor gases has an influence on chemical structure, morphology and surface energetic properties of the films and does not have an influence on Young's modulus. Keywords: silicon nitride, plasma deposition, deposition of a gas phase, microelectromechanical converters, su­perficial microprocessing, a sacrificial layer, an elektron-cyclotron resonance.

Item Type:Article
Additional Information:Full text is in Russian
ID Code:10184
Deposited By:Prof. Alexey Ivanov
Deposited On:08 Dec 2010 23:39
Last Modified:09 Dec 2010 09:29

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