Nano Archive

Physical and Technological Basis of Nanodimentional Ion Beam Technology Application for Creation of Micro- and Nanosystem Technique

Kuznetsov, M.A. and Luchinin, V.V. and Savenko, A.Yu. (2009) Physical and Technological Basis of Nanodimentional Ion Beam Technology Application for Creation of Micro- and Nanosystem Technique. Journal of NANO and MICROSYSTEM TECHNIQUE (8).

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Official URL: http:// www.microsystems.ru

Abstract

Results of technological operations development based on focused ion beam are represented. This includes nanodimensional precise local ion beam etching, ion assister (stimulated) chemical etching and ion assisted de­position of different materials. Relationship between main ion beam parameters and achievable characteristics of local etching and deposition processes of base electronics materials is determined. Examples of practical ap­plication of FIB technology are given in the field of design, modification and preparing of nano- and microsys­tem technique. Keywords: focused ion beam, ion beam etching, ion assisted etching and deposition.

Item Type:Article
Additional Information:Full text is in Russian
ID Code:10175
Deposited By:Prof. Alexey Ivanov
Deposited On:08 Dec 2010 23:39
Last Modified:09 Dec 2010 09:29

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