Kuznetsov, M.A. and Luchinin, V.V. and Savenko, A.Yu. (2009) Physical and Technological Basis of Nanodimentional Ion Beam Technology Application for Creation of Micro- and Nanosystem Technique. Journal of NANO and MICROSYSTEM TECHNIQUE (8).
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Results of technological operations development based on focused ion beam are represented. This includes nanodimensional precise local ion beam etching, ion assister (stimulated) chemical etching and ion assisted deÂposition of different materials. Relationship between main ion beam parameters and achievable characteristics of local etching and deposition processes of base electronics materials is determined. Examples of practical apÂplication of FIB technology are given in the field of design, modification and preparing of nano- and microsysÂtem technique. Keywords: focused ion beam, ion beam etching, ion assisted etching and deposition.
|Additional Information:||Full text is in Russian|
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||08 Dec 2010 23:39|
|Last Modified:||09 Dec 2010 09:29|
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