Physical and Technological Basis of Nanodimentional Ion Beam Technology Application for Creation of Micro- and Nanosystem Technique

Abstract

Results of technological operations development based on focused ion beam are represented. This includes nanodimensional precise local ion beam etching, ion assister (stimulated) chemical etching and ion assisted de­position of different materials. Relationship between main ion beam parameters and achievable characteristics of local etching and deposition processes of base electronics materials is determined. Examples of practical ap­plication of FIB technology are given in the field of design, modification and preparing of nano- and microsys­tem technique. Keywords: focused ion beam, ion beam etching, ion assisted etching and deposition.